Uniform spin coating up to 12,000 rpm
Uniform spin coating up to 12,000 rpm
Spin etch – develop – clean - coat
Spin etch – develop – clean - coat
Megasonic cleaning on spin coater
Megasonic cleaning on spin coater
Slider.jpg
World Wide Support
2 year warranty
Custom System Configuration

 

Spin coater Drying

The POLOS spin coaters have proven to be an excellent cleaning, rinsing and drying solution after wafer processing.

Please find below our cost-effective POLOS SPIN150i and SPIN200i spin processors for spin drying. With a low contact mechanical chuck no vacuum line or vacuum pump is required.

Requirements:

Application:

  • Single Wafer Chemical or Residual Removal

  • Spin, Rinse, and Dry semiconductor wafers after a wet process 

  • Cleaning up to 300mm wafers utilizing DI Water Rinse, followed by heated N2 dry

 

 

Recommended models*:

* Models are standard supplied with vacuum chuck , mechanical chucks are optionally available, depending on substrate.

Note: For batch applications: sps-europe.com offer refurbishment services of your SRD Spin Rinse Dryers. Contact us!

 

www.spincoating.com is powered by www.sps-europe.com