SPIN150i
Our high - quality, all NPP POLOS single wafer spin coaters are specifically designed for R&D and low volume production in the MEMS, Semiconductor, PV, Microfluidics field, etc. Suitable for all typical spin processes: cleaning, rinse/dry, coating, developing and etching.
The low-cost SPIN150i spin coater is suitable for processing fragments as small as 5 mm up to Ø150 (or 6”) or 4" x 4" substrates. Detachable touchpanel. Unlimited Program Storage for recipes with multiple steps each (CW & CCW rotation for puddle spin coating applications.)
Highlights
- Large process variety including spin coating and puddle developing
- Small footprint
- Large colour touchscreen
- Designed for a variety of photolithograpy chemicals
+31 341 360 590
Table Top Model for manual or optionally automated chemical dispense. High quality seamless NPP fabrication. Optional in PTFE. Includes a vacuum chuck and FREE fragment adapter
Easy in-deck integration in your existing or new wetbench. Available in natural polypropylene (NPP) or optional PTFE process chamber. Includes a vacuum chuck and FREE fragment adapter
Specifications | |
Available number of programs | Unlimited * |
Steps per program | Unlimited * |
Spin speed* | 1 - 12,000 rpm ** ± 1rpm steps |
Spin speed accuracy | ± 0.1 rpm ** |
Spin rotational direction | Clockwise, Counter clockwise, Puddle |
Max. acceleration | 30,000 rpm/sec ** |
Spin time | Unlimited*, ± 0.1 seconds steps |
Free programmable outputs | 3 dry relays, nominal switching capacity 0.5A /125 VAC - 0.3A / 60DC |
System data | |
Housing material | Natural Polypropylene (NPP) *** |
Process chamber material | Natural Polypropylene (NPP) *** |
Interface | Detachable, full-size touchscreen, glove-friendly,IP52, chemical resistant |
External connection | 1 USB Port in the controller |
Max. substrate diameter | 160mm round or 4ʺ x 4ʺ square |
Max. process chamber diameter | 202 mm |
Dimension (desktop version) | 274 (w) x 250 (h) x 451 (d) mm |
Shipping weight | 14 kgs |
Shipping dimension | 600 x 380 x 360 mm |
Requirements | |
Voltage | 100 - 120 VAC / 200 - 240 VAC 50/60 Hz (auto select) |
Power consumption | Max. 500 W |
Max. current | 5A / 2.5A |
Vacuum | - 65 kPa (-19 inchHg), ≥ 80 lpm Tube OD Ø8mm |
Motor purge gas | 20 - 50 kPa, 2-5 l/min, Tube OD Ø 6mm |
Drain connection | 1” M-NPT |
* Considering additional capability of standard unit such as USB backup, recipe cycling, PC software etc.
** Measured without substrate, limitations may apply depending on chuck used and substrate specification.
*** For our spin processors and chucks we use NPP-H with α-crystalline properties.
Features
- • Affordable Spin Coater for universities
- • Spin processor for cleaning, drying, coating, developing and/or etching of up to Ø 160 mm substrates
- • Full-Plastic System in Natural Polypropylene (NPP)
- • Table-Top Model for manual or automated (optional) chemical dispense
- • Transparent Lid with syringe holder for central dispensing
- • Electro-magnetic safety lid lock
- • Detachable controller interface for easy integration
- • N2 diffuser for N2 purge during process.
- • Easy, step- by- step recipe programming via large colour touchscreen.
- • Unlimited Program Storage for recipes with multiple steps / each for:
- • Time 0.1-99999 sec/step
- • Speed 0-12,000 rpm **
- • Rotation direction (CW, CCW, puddling)
- • Acceleration /Deceleration 1-30,000 rpm/sec.**,selectable per step
- • Vacuum On /Off
- • 3 Programmable Dry Contacts: e.g. for automated control of Dispense unit, Nitrogen diffuser, etc.
- • Structured and password protected recipe storage for easy and safe management
- • Digitally controlled Motor with digital incremental speed signal feed back
- • Includes: (1) standard Vacuum Chuck
- • A-V36-S45-PP, Ø45 mm for up to Ø 6“ wafers D-V10-S50-PP, Small Fragment Adapter for Ø ½“- Ø 2’’ Pieces and Fragments (Alternative Chucks optionally available)
- • Drain connection 1” male NPT
- • (Exhaust Hose optional)
** Measured without substrate, limitations may apply depending on chuck used and substrate specification.
Liners are available in PET (Polyethylenterephthalat). 0.5mm thick, transparent, antistatic (108 - 1010 Ω) to prevent possible build-up of static charge in the chamber.
Consisting of several 30cc dispense barrels, needles and plungers.
For single or triple syringes, with integrated N2 diffuser.
Can be mounted in syringe holder and be connected to one of the 3 programmable dry contacts.
For hand free usage; controlling start/stop function and vacuum.
In NPP, including connection to connect to the drainport.
Customized vacuum or mechanical chucks are available for almost any application.
Chucks are available in following materials:
- PP: NPP with EPDM o-ring
- FP: PTFE (TFM 1600 with FKM o-ring) alternatively for thin substrates: porous PTFE
Note: other materials available on request, please contact us for details.
Dies, Wafer, Fragments, etc.
Vacuum for 2" up to 300mm Wafer.
Vacuum and Centering pins.
Mask, Solar Cells, etc.
Mechanical and Centering pins.
Labaratory Glass, etc.
Foils, etc.