SPIN150i

 
THE SPIN150i SPIN COATER

Our high - quality, all NPP POLOS single wafer spin coaters are specifically designed for R&D and low volume production in the MEMS, Semiconductor, PV, Microfluidics field, etc. Suitable for all typical spin processes: cleaning, rinse/dry, coating, developing and etching.

The low-cost SPIN150i spin coater is suitable for processing fragments as small as 5 mm up to Ø150 (or 6”) or 4" x 4" substrates. Detachable touchpanel. Unlimited Program Storage for recipes with multiple steps each (CW & CCW rotation for puddle spin coating applications.)

Highlights

  • Large process variety including spin coating and puddle developing
  • Small footprint
  • Large colour touchscreen
  • Designed for a variety of photolithograpy chemicals

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SPIN COATERS SPIN150i-NPP Table Top / SPIN150i-PTFE Table Top
Table Top Model for manual or optionally automated chemical dispense. High quality seamless NPP fabrication. Optional in PTFE. Includes a vacuum chuck and FREE fragment adapter
SPIN COATERS SPIN150i NPP Integrator / SPIN150i PTFE Integrator
Easy in-deck integration in your existing or new wetbench. Available in natural polypropylene (NPP) or optional PTFE process chamber. Includes a vacuum chuck and FREE fragment adapter

Details

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