POLOS300 Advanced
The Polos 300 advance single substrate spin coater is perfectly suitable for a wide range of applications, including drying, rinsing, cleaning, and coating. This table top spin coater is seamless build in a full-plastic, housing in natural polypropylene (NPP) or optional PTFE, and is suitable for processing fragments as small as 5mm up to substrates sizes up to Ø300 or 8" x 8".
Includes a FREE vacuum chuck
TYPICAL APPLICATIONS FOR THE POLOS 300 SPIN COATERS:
+31 341 360 590
Specifications | |
Available number of programs | Unlimited * |
Steps per program | Unlimited * |
Spin speed* | 1 - 12,000 rpm** ± 1rpm steps |
Spin speed accuracy | ± 0.1 rpm ** |
Spin rotational direction | Clockwise, Counter clockwise Puddle |
Max. acceleration | 30,000 rpm/sec ** |
Spin time | |
Programmable outputs | 3 dry relays, nominal switching capacity 0.5A /125 VAC - 0.3A / 60DC |
System data | |
Housing material | Natural Polypropylene (NPP) *** or High Chemical Resistant PTFE (TFM) |
Process chamber material | Natural Polypropylene (NPP) *** or High Chemical Resistant PTFE (TFM) |
Interface | Detachable, full-size touchscreen, glove-friendly, IP52, chemical resistant |
External connection | 1 USB Port in the controller |
Max. substrate diameter | 360mm round or 8ʺ x 8ʺ square |
Max. process chamber diameter | 402 mm |
Dimension (desktop version) | 430 (w) x 310 (h) x 650 (d) mm |
Shipping weight | 32 kgs |
Shipping dimension | 780 (w) x 620 (h) x 580 (d) mm |
Requirements | |
Voltage | 100 - 120 VAC / 200 - 240 VAC 50/60 Hz (auto select) |
Power consumption | Max. 1800 W |
Max. current | 10A / 8A |
Vacuum | - 80 kPa (-24 inchHg), ≥ 80 lpm Tube OD Ø8mm |
Motor purge gas | 20 - 50 kPa, 2-5 l/min, Tube OD Ø 6mm 500lph |
Drain connection | 1” M-NPT |
* Considering additional capability of standard unit such as USB backup, recipe cycling, PC software etc.
** Measured without substrate, limitations may apply depending on chuck used and substrate specification.
*** For our spin processors and chucks we use NPP-H with α-crystalline properties.
Features
- • Automatic Chemical Dispense:
- • Dispensing fluids through up to 6 spray nozzles
- • Each programmable for sequential or parallel dispense
- • Clear/Transparant Domed ECTFE Lid with central integrated N2 shower purge
- • Available in:
- • Seamless Full-Plastic Housing in Natural Polypropylene (NPP)
- • Seamless Full-Plastic Housing in High Chemical Resistant PTFE (TFM)
- • Table Top spin coater Model: dimensions: 43cm (w) x 65cm (d) x 31cm (h)
- • Substrate wafer size: fragments and substrates up to Ø360mm or 8"x8"
- • Heavy-Duty Servo-Controlled Motor:
- • Assuring repeatable rpm rates
- • Rotation Speed Adjustable 1 to 10.000 rpm
- • Clockwise and Counterclockwise Rotation
- • Puddle function for developer purposes
- • Easy, step by step Programming via Gloved-Finger-Friendly, Full-Size Keyboard with LED Backlit Display
- • Programmable Digital Process Controller:
- • Storage of multiple programs of 99 Step Recipes each, for:
- • Speed 1-10.000rpm, Time, Acceleration
- • Vacuum On/Off
- • Relay Open/Close
- • Multi-User Access Levels
- • Storage of multiple programs of 99 Step Recipes each, for:
- • 2 Programmable ON/OFF Switching Outputs
e.g. for Dispense On/Off, Nitrogen On/Off, etc. - • Drain connection
- • CE-approved
Full PTFE Dispense Vessel Automated injector line
The Sapphire MegPie is a single-wafer Megasonic
transducer for cleaning and sonochemical
processing
In NPP, including connection to connect to the drainport.
Customized vacuum or mechanical chucks are available for almost any application.
Chucks are available in following materials:
- PP: NPP with EPDM o-ring
- FP: PTFE (TFM 1600 with FKM o-ring) alternatively for thin substrates: porous PTFE
Note: other materials available on request, please contact us for details.
Dies, Wafer, Fragments, etc.
Vacuum for 2" up to 300mm Wafer.
Vacuum and Centering pins.
Mask, Solar Cells, etc.
Mechanical and Centering pins.
Labaratory Glass, etc.
Foils, etc.