A spin coater is mostly used for creating thin films with thicknesses below
10 nm of even, high quality thickness, using centripetal force. Typically you spin coat photoresist on a semiconductor wafer, but our spin coaters are also used for spin coating polymer thin films like blockcopolymers (BCP) as PDMS and PMMA, or as a low-cost sol–gel method e.g. for spin-coated ZnO films.
Please select your material.
Please choose if syringe holder for center dispensing or static barrier plate is required.
Please specify the dispense system if required.
Choose your first topside injector type.
Choose your second topside injector type.
Please indicate if an automated chemical delivery system is required.
Please indicate if a second automated chemical delivery system is required
Please indicate preferred drain option.
Please specify the required drain tube length.
Please indicate if a drain canister is required for waste storage.