Choose your POLOS® Spin Coater size

Do you expect to use strong chemicals or acids in your POLOS® Spincoater? As example; HF, HN03, KOH, Etc. See our chemical compatibility list

How would you like to dispense your media? Our recommendation for manual dispensing: Syringe Holder Starter Kit, for Semi-automatic and automatic we have different options by application.

How many media would you like to use? 1 media (Single Syringe Dispense) or 3 media (Multi Syringe Dispense).

How many configurable dispense lines would you like to add to your POLOS® Spin processor.

What nozzle would you like to use? 

• Fan Spray Nozzles are primarily used for coating and developing and create a mist-like dispense. 
• Jet Spray Nozzles are primarily used for direct dispense during etching, rinsing and drying applications. 
• EBR Nozzles are used for Edge Bead Removal applications where a user removes any build-up photoresist at the edge of the wafer.

Choose your preferred POLOS® Dispense Pump.

• Our Presurized Syringe Pump allows better repeatability during syringe based applications, connect the pressure generator directly to your syringe and select the desired pressure to start dispensing. 
• Our Dosing Pump can be screwed directly to the top of your resist bottle and allows for precise dispensing of photoresist, by selecting the volume and dispense time you can fine-tune your photoresist dispense step. 
• Our POLOS® Peristaltic Pump is the go to pump for allmost all applications, the option to replace/swap the dispense line will allow you to use a silicon tube for resist applications while a Pharmed® tube version is also available for more aggresive developer, solvents or acids. To check compatibility, please reach out to one of our sales representatives.

Choose your preferred POLOS® Dispense solution

• Our POLOS® Dispense Vessel supports dispensing of the most aggressive chemicals and acids, you can pour your fluid directly into the thick-walled PTFE vessel or load a bottle. By regulating the pressure, the dispense volume can de defined. A spinner-controlled suck back valve will allow you to open or close the dispense line during your process step. 
• Our POLOS® Peristaltic Pump is the go-to pump for almost all applications, the option to replace/swap the dispense line will allow you to use a silicon tube for resist applications while a Pharmed® tube version is also available for more aggressive developer, solvents, or acids. To check compatibility, please reach out to one of our sales representatives.

What nozzle would you like to use? 

• Fan Spray Nozzles are primarily used for coating and developing and create a mist-like dispense. 
• Jet Spray Nozzles are primarily used for direct dispense during etching, rinsing and drying applications. 
• EBR Nozzles are used for Edge Bead Removal applications where a user removes any build-up photoresist at the edge of the wafer.

Choose your preferred POLOS® Dispense Pump.

• Our Presurized Syringe Pump allows better repeatability during syringe based applications, connect the pressure generator directly to your syringe and select the desired pressure to start dispensing. 
• Our Dosing Pump can be screwed directly to the top of your resist bottle and allows for precise dispensing of photoresist, by selecting the volume and dispense time you can fine-tune your photoresist dispense step. 
• Our POLOS® Peristaltic Pump is the go to pump for allmost all applications, the option to replace/swap the dispense line will allow you to use a silicon tube for resist applications while a Pharmed® tube version is also available for more aggresive developer, solvents or acids. To check compatibility, please reach out to one of our sales representatives.

Choose your preferred POLOS® Dispense solution

• Our POLOS® Dispense Vessel supports dispensing of the most aggressive chemicals and acids, you can pour your fluid directly into the thick-walled PTFE vessel or load a bottle. By regulating the pressure, the dispense volume can de defined. A spinner-controlled suck back valve will allow you to open or close the dispense line during your process step. 
• Our POLOS® Peristaltic Pump is the go-to pump for almost all applications, the option to replace/swap the dispense line will allow you to use a silicon tube for resist applications while a Pharmed® tube version is also available for more aggressive developer, solvents, or acids. To check compatibility, please reach out to one of our sales representatives.

What nozzle would you like to use? 

• Fan Spray Nozzles are primarily used for coating and developing and create a mist-like dispense. 
• Jet Spray Nozzles are primarily used for direct dispense during etching, rinsing and drying applications. 
• EBR Nozzles are used for Edge Bead Removal applications where a user removes any build-up photoresist at the edge of the wafer.

Choose your preferred POLOS® Dispense Pump.

• Our Presurized Syringe Pump allows better repeatability during syringe based applications, connect the pressure generator directly to your syringe and select the desired pressure to start dispensing. 
• Our Dosing Pump can be screwed directly to the top of your resist bottle and allows for precise dispensing of photoresist, by selecting the volume and dispense time you can fine-tune your photoresist dispense step. 
• Our POLOS® Peristaltic Pump is the go to pump for allmost all applications, the option to replace/swap the dispense line will allow you to use a silicon tube for resist applications while a Pharmed® tube version is also available for more aggresive developer, solvents or acids. To check compatibility, please reach out to one of our sales representatives.

Choose your preferred POLOS® Dispense solution

• Our POLOS® Dispense Vessel supports dispensing of the most aggressive chemicals and acids, you can pour your fluid directly into the thick-walled PTFE vessel or load a bottle. By regulating the pressure, the dispense volume can de defined. A spinner-controlled suck back valve will allow you to open or close the dispense line during your process step. 
• Our POLOS® Peristaltic Pump is the go-to pump for almost all applications, the option to replace/swap the dispense line will allow you to use a silicon tube for resist applications while a Pharmed® tube version is also available for more aggressive developer, solvents, or acids. To check compatibility, please reach out to one of our sales representatives.

Vacuum at point of use - add our POLOS® Vacuum Pump (230V and 110V available).

Perfect fitting syringes - add our POLOS® Syringe Holder Starters Kit

Drain to your in-house (drain)facilities - add our POLOS® Drain hose.

Improve your Photoresist coating uniformity - add our POLOS® Static Barrier Plate.

Keep your spinner clean at all times and collect valuable media - add our POLOS® Antistatic PET Liner Set (20pcs).

Align your wafers and square substrates with ease - add our POLOS® Centering Aid.