Automatic Dispense Spin coaters
The single substrate spin coater are perfectly suitable for a wide range of applications, including drying, rinsing, cleaning, and coating. All of our spin coaters are also available in indeck versions. Photoresist is typically spun at 1000 to 4000 revolutions per minute for 30 to 60 seconds to achieve uniformity.
Spincoating is one of the most common techniques used for the fabrication of (nanometric) polymer thin films (PMMA, PDMS, blockcopolymers, etc.). The acceleration within the programmable spin speed is important as it defines the range of thicknesses that can be achieved from a given solution. In general, spin coating can produce uniform films relatively easily from about 1,000 rpm upwards
The advantages of the Polos range spin coaters with high speed up to 12,000rpm and in ramp-up of 0.3 sec* are its ability to quickly and easily produce very uniform films from a few nanometres to several few microns in thickness.
The control of the motor mode rotation (clockwise/counterclockwise), in combination with the up to 6 automatic dispensers in the POLOS Advanced systems, enables a uniform deposition of multilayer thin films and photoresist development. These features enable a quick process optimization with fully automatic recipes and high reproducibility.
The physical and chemical cleanliness of a substrate is critical for high quality films regardless of the application method. Our units can be incorporated with Megasonic allowing one system for a wide range of processes.
*depending on substrate size and chuck type