Substrate size ≤ 150mm
Substrate size ≤ 200 mm
Substrate size ≤ 300mm
Substrate size ≥ 450mm
Spin Process Stations

Automatic Coating

Automatic Dispense Spin coaters

The single substrate spin coater are perfectly suitable for a wide range of applications, including drying, rinsing, cleaning, and coating. All of our spin coaters are also available in  indeck versions. Photoresist is typically spun at 1000 to 4000 revolutions per minute for 30 to 60 seconds to achieve uniformity.  

Up to 200mm
  SPIN COATER POLOS200 Advanced NPP
  SPIN COATER POLOS200 Advanced PTFE

Up to 300mm
  SPIN COATER POLOS300 Advanced NPP
  SPIN COATER POLOS300 Advanced PTFE

    Spincoating is one of the most common techniques used for the fabrication of (nanometric) polymer thin films (PMMA, PDMS, blockcopolymers, etc.). The acceleration within the programmable spin speed is important as it defines the range of thicknesses that can be achieved from a given solution. In general, spin coating can produce uniform films relatively easily from about 1,000 rpm upwards

    The advantages of the Polos range spin coaters with high speed up to 12,000rpm and in ramp-up of 0.3 sec* are its ability to quickly and easily produce very uniform films from a few nanometres to several few microns in thickness.

    The control of the motor mode rotation (clockwise/counterclockwise), in combination with the up to 6 automatic dispensers in the POLOS Advanced systems, enables a uniform deposition of multilayer thin films and photoresist development. These features enable a quick process optimization with fully automatic recipes and high reproducibility.

    The physical and chemical cleanliness of a substrate is critical for high quality films regardless of the application method. Our units can be incorporated with Megasonic allowing one system for a wide range of processes.

    *depending on substrate size and chuck type 

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