Automatic Coating

Automatic dispense spin processors

POLOS^® single-substrate spin coaters are ideal for a wide range of applications, including drying, rinsing and cleaning, and coating. All models are also available in in-deck configurations for seamless integration into your production line.

In typical photoresist coating, wafers are spun at 1,000–4,000 rpm for 30–60 seconds to achieve excellent uniformity. Spin coating is one of the most widely used techniques for producing nanometric polymer thin films (PMMA, PDMS, block copolymers, and more). By adjusting acceleration within the programmable spin profile, a broad range of film thicknesses can be achieved from a single solution.

POLOS^® spin coaters deliver distinct advantages:

• High-speed capability up to 12,000 rpm
• Ultra-fast ramp-up of 0.3 seconds * (depending on substrate size and chuck type)
• Uniform films from just a few nanometers to several microns thick
• Motor control modes: clockwise, counterclockwise, and puddle
• Up to 6 automatic dispensers (Advanced systems) for multilayer thin films and photoresist development
• Fully automatic recipes for quick process optimization and high reproducibility

For superior film quality, substrate cleanliness is essential. POLOS^® systems can be equipped with Megasonic cleaning, enabling one platform to handle an extensive range of processes.

Recommended models:

• Up to 150 mm
• Up to 200 mm
• Up to 300 mm