Rinse / Cleaning
Traditional batch hydrogen peroxide-based wafer cleaning methods involve immersion in tanks for RCA and SC2 cleaning. POLOS offers a range of PTFE or Heated Quartz Tanks.
Newer cleaning methods, where fresh chemicals are continuously supplied to the substrate, include single wafer spin cleaning. Standard configurations are available for cleaning wafers as well as photomasks.
Successfully installed at customers worldwide, e.g. FhG ENAS in Germany.
Application:
- Si Wafer Cleaning
- Mask Cleaning
- Metal Lift Off
- Post-CMP Cleaning: Example Post-CMP Cleaning
Requirements:
- Choice of Vacuum or Non-Vacuum Chuck
- Basic up to 3 lines or Automatic Chemical Dispense
Optional:
- BSR Back-Side Rinse, with adjustable position and spray angle (only with mechanical chucks)
Recommended models*:
- Manual / Automatic Dispense
NOTE: check the chemical compatibility of your process with the NPP or PTFE bowl-material!
