Spin Coater Applications
Spin processing is a key technique in the semiconductor industry, enabling precise coating, cleaning, and etching of a wide range of substrates. Whether you're working with wafers, photomasks, microscope slides, or small pieces, spin coating offers a reliable way to create ultra-thin films, even below 10 nm.
At POLOS®, our spin coaters are designed for both cleaning and photolithography applications, including the uniform deposition of photoresist layers around 1 µm thick. Available for all substrate sizes up to 450 mm, POLOS® systems support everything from R&D to full-scale production.
Explore the pages below to learn how spin processing works and where it can enhance your process.
