SPIN150x Spin coater - Advanced

Product description

Our next-generation POLOS® SPIN150x spin processor features upgraded design elements for enhanced process stability and user flexibility. Engineered for high-precision coating and repeatability, this system is available in Natural Polypropylene (NPP) or chemically resistant PTFE configurations. Choose between the Standard or Advanced model to suit your lab’s workflow. This Advanced model is standardly equipped with a dispense vessel, auto-closing lid, linear dispense arm and backside rinse feature.

Designed to support a wide variety of substrates, the system accommodates wafers up to 150 mm in diameter or 100 x 100 mm square samples, making it a versatile choice for both research and production settings.

The spin coater is suitable for:

Coating
Cleaning
Rinse/Dry
Developing
Etching
PDMI and other processes

Modular by design

The cleverly engineered outer casing and drain system support seamless in-field conversion between a table-top and in-deck installation. A modular layout offers futureproofing through a wide array of accessories, making upgrades and integration with dispensing tools straightforward.

Automation-ready

Integration into robotic systems is simplified with the SPINx-series thanks to customizable motor homing positions, allowing for precise alignment during automated wafer handling.
For added convenience, the raised vacuum chuck sits above the bowl’s edge, facilitating safe, efficient access to substrates using tweezers, vacuum wands, or robotic end-effectors. This layout supports automation and minimizes handling errors.

Built-in liquid filter protection

To shield key internal components from contamination, the SPIN150x features a dedicated liquid filter trap. Positioned between the chamber and vacuum lines, it collects any accidental fluid ingress, protecting the vacuum sensor, drive system, and ServoBL Controller. Collected liquids are stored safely in a removable jar, visible through a side housing window for quick maintenance checks. We recommend inspecting and emptying the jar regularly as part of your preventative maintenance routine.

Specifications hardware SPIN150x:

Process chamber Material: Natural polypropylene (NPP) or PTFE
Max. substrate diameter: Up to 6” (150 mm) wafers or 4” x 4” (100 mm) substrates
Liquid filter trap
Automatic lid, also controllable via foot pedal (advanced version)
Programmable motor homing position
Center injection holder for syringe or dispense nozzle
Lid lock and vacuum sensor for user safety
Large (detachable) touchscreen display
USB-port to store recipes on USB-drive and for software updates specifications drive-unit
Indirect brushless drive unit - up to 12.000 RPM
High acceleration and accuracy: 1 - 30.000 RPM
Clockwise/counter clockwise rotation and puddle mode
Unique design to switch between desktop and in-deck model