Spin Coater Drying
POLOS® spin coaters are a proven, cost-effective solution for cleaning, rinsing, and drying wafers after processing.
Our POLOS® SPIN150x, SPIN200x, and SPIN300x models are ideal for spin drying without the need for a vacuum line or pump, thanks to their low-contact mechanical chuck, which touches only the wafer edge for minimal risk of contamination.
Typical applications include:
- Single wafer chemical or residue removal
- Spin, rinse, and dry after wet processing
- Cleaning wafers up to 300 mm using a DI water rinse followed by heated nitrogen drying
Recommended models*:
* All models are supplied with a vacuum chuck as standard; mechanical chucks are available as an option depending on your substrate.For batch processing: We also provide refurbishment services for SRD Spin Rinse Dryers.
Contact Us For More Information!
