Spin Coater WIth Megpie Megasonic Transducer

What is Megasonic processing?

Megasonic processing is a highly effective cleaning method for delicate, contamination-sensitive products. It uses high-frequency acoustic energy to remove particles without causing damage. Our MegPie® Megasonic Transducer delivers exceptional cleaning performance across a wide range of demanding applications.

About the MegPie^®

The MegPie is a patented radial megasonic array designed to apply uniform acoustic energy to a rotating substrate. Mounted above the substrate, it delivers consistent cleaning by transmitting energy through a thin layer of process fluid.

Key features:

• Uniform energy distribution across the entire substrate surface
• Easy integration into existing spin coaters
• Available in standard and custom designs

How it works

The ProSys MicroPulse control and MicroPower generator supply RF energy to the MegPie array. A precise gap between the transducer and substrate (typically 0.1–3.0 mm) is set according to the process fluid, substrate size, and rotational speed.

Note: For best results, rotational speeds above 60 RPM are not recommended, as higher speeds can cause voids or bubbles in the fluid layer, reducing acoustic efficiency.

For an example application, see: Megasonic-Enhanced Photoresist Strip with DiO₃.

The MegPie system can dispense DI water from the same manifold used for megasonic cleaning—without activating the megasonic function. The demo unit’s dispense line includes our standard SSV valve, controlled directly via Polos software.
If you require an additional dispense line (e.g., spray or jet nozzle), we can provide a custom lid with the necessary components, such as valves and swivel heads.