The next-generation POLOS® SPIN200x spin processor features advanced design upgrades for improved process stability, coating precision, and user control. Engineered for high repeatability and flexibility, the system is available in chemically resistant PTFE or Natural Polypropylene (NPP) and can be configured as either a Standard or Advanced model to match your lab’s specific needs. This Advanced model is standardly equipped with a dispense vessel, auto-closing lid, linear dispense arm and backside rinse feature.
Flexible substrate support
Whether you're in R&D or production, the SPIN200x is built for versatility. It supports a wide range of wafer and sample types, accommodating round substrates up to 200 mm or square samples up to 150 x 150 mm.
The spin coater is suitable for:
- Coating
- Cleaning
- Rinse/Dry
- Developing
- Etching
- PDMI and other processes
Modular & convertible
Thanks to its smart modular architecture, the system can be used as a table-top unit or easily converted for in-deck integration. The redesigned casing and integrated drain simplify upgrades, and a full range of accessories ensures long-term compatibility with future process enhancements and dispensing tools.
Automation-ready design
Ready for robotic integration, the SPIN200x offers configurable motor homing positions for accurate alignment during automated wafer handling. The raised vacuum chuck extends above the bowl’s edge, streamlining access for tweezers, vacuum wands, or robotic end-effectors, minimizing handling errors and supporting seamless automation.
Integrated liquid filter protection
A built-in liquid filter trap protects sensitive internal components by capturing any unintended fluid ingress before it reaches the vacuum sensor, drive system, or ServoBL Controller. A transparent side window makes visual checks easy, and the removable collection jar simplifies maintenance. Regular inspections are recommended as part of your preventative maintenance routine.
Specifications hardware SPIN200x:
- Process chamber material: Natural polypropylene (NPP)
- Max. substrate diameter: Up to 8” (200 mm) wafers or 6” x 6” (150 mm) substrates
- Liquid filter trap
- Automatic lid, also controllable via foot pedal (advanced version)
- Programmable motor homing position
- Center injection holder for syringe or dispense nozzle
- Lid lock and vacuum sensor for user safety
- Large (detachable) touchscreen display
- USB-port to store recipes on USB-drive and for software updates specifications drive-unit
- Indirect brushless drive unit - up to 12.000 RPM
- High acceleration and accuracy: 1 - 30.000 RPM
- Clockwise/counter clockwise rotation and puddle mode
- Unique design to switch between desktop and in-deck model
Complimentary chuck and adapter:
- Vacuum chuck for 4 - 8-inch wafers
