The POLOS® Hotplate 200 is a compact, table-top solution designed for precise thermal processing in research labs and pilot-scale production. Ideal for soft bake, hard bake, and curing processes, it supports a wide range of materials including photoresist, epoxy, and other temperature-sensitive compounds. A soft-close lid ensures smooth, controlled handling during processing.
Engineered for versatility
Whether you're performing standard thermal cycles or more advanced bake routines, the POLOS® Hotplate 200 delivers stable, uniform heating for wafers and substrates up to 200 mm, making it a dependable choice for demanding applications. It’s an affordable, high-performance tool for labs seeking reliable results without the footprint of large-scale systems.
Advanced features, built-in
This Advanced version offers enhanced functionality right out of the box. Standard features on the advanced model include:
- N₂ connector for inert atmosphere baking
- Lifting pins for substrate handling
- Vacuum bake capability
- Proximity pins for controlled contactless baking
Indeck conversion made simple
With our specially designed in-deck and display bracket kit, the POLOS® Hotplate 200 can be seamlessly converted from table-top to in-deck installation, giving you complete flexibility as your lab setup evolves.
