SPIN COATER SUPPORT
Life-time free software updates, and 2 year warranty for
our spin coaters. Spin coaters instruction video's:
Programming via the Display Control Panel- Use of Centering Aid
- Chuck Exchange
- Use of Liner inserts
- Use of Syringe Holder
For more instruction video's see our youtube Channel.
Get the latest software update for SPIN150i & POLOS-SPIN200i, click on the link below and register as a customer to get access to the software updates:
If you required support for your spin coater, please fill in the form below and you will be contacted as soon as possible.
Support request
Use below form to get support on your spinner. Please fill in the form as complete as possible:
Applications
The POLOS spin coaters have proven to be an excellent cleaning, rinsing and drying solution after wafer processing.
Rinse / CleaningTraditional batch hydrogen peroxide-based wafer cleaning methods involve immersion in tanks for RCA and SC2 cleaning.
Puddle etching method of thin film by using spin coater. All unit are suitable for Puddle etching processes.
Manual Dispense Spin Coater are perfectly suitable for a wide range of applications, including drying rinsing cleaning, and coating.
Automatic Dispense Spin coater are perfectly suitable for a wide range of applications, including drying, rinsing, cleaning, and coating.
A full range of substrate size matching vacuum or non-vacuum chucks is available, for easy centering.