Rinse / Cleaning

Conventional hydrogen peroxide-based wafer cleaning -such as RCA and SC2 processes- typically relies on immersion in dedicated tanks. POLOS^® offers high-quality PTFE and heated quartz tanks designed for these methods.

For more advanced cleaning, modern single wafer spin cleaning systems supply fresh chemicals continuously to the substrate, delivering superior results for both wafers and photomasks. Standard configurations are available to suit a variety of applications and process needs.

Proven worldwide: Our systems are successfully installed at customer sites across the globe.

Typical applications include:

• Silicon wafer cleaning
• Photomask cleaning
• Metal lift-off
• Post-CMP cleaning

System requirements:

• Choice of vacuum or non-vacuum chuck
• Basic up to 3-line chemical dispense or fully automatic dispense

Optional features:

• Back-Side Rinse (BSR) with adjustable position and spray angle (available with mechanical chucks)

Recommended models*:

• Manual or automatic dispense configurations