The POLOS® SPIN300x spin processor brings next-generation performance to your lab or fab. With a refined design for enhanced process stability and greater user control, this system delivers high-precision coating and reliable repeatability. Choose between chemically resistant PTFE or Natural Polypropylene (NPP) materials to match your workflow requirements. The SPIN300x series is available in an Advanced model only, meaning it is standardly equipped with a dispense vessel, auto-closing lid, linear dispense arm and backside rinse feature.
This spin processor is suitable for:
- Coating
- Cleaning
- Rinse/Dry
- Developing
- Etching
- PDMI and other processes
Built to handle a broad range of applications, the SPIN300x supports wafers up to 300 mm in diameter or square substrates up to 200 x 200 mm. This makes it an ideal solution for both research environments and production lines.
Modular. Convertible. Future-ready.
Designed with flexibility in mind, the system features a smart outer casing and integrated drain for easy field conversion between table-top and in-deck installations. Its modular architecture supports a wide selection of accessories, enabling quick upgrades and smooth integration with dispense systems and automation tools.
Optimized for automation
The SPIN300x is automation-ready out of the box. Customizable motor homing positions simplify robotic alignment and wafer handling. A raised vacuum chuck sits above the bowl edge, giving users or robots direct, unobstructed access with tweezers, vacuum wands, or end-effectors, minimizing handling errors and streamlining throughput.
Integrated contamination protection
To protect critical internal components, a built-in liquid filter trap captures accidental fluid ingress before it reaches the vacuum sensor, drive system, or ServoBL Controller. The collected liquid is stored in a removable catch jar, easily viewed through a side window for fast maintenance checks. Regular inspection and emptying are recommended to ensure optimal system performance.
Specifications hardware SPIN300x:
- Process chamber Material: Natural polypropylene (NPP) or PTFE (Optionally available)
- Max. substrate diameter: Up to 12” (300 mm) wafers or 8” x 8” (200 mm) substrates
- Liquid filter trap
- Automatic lid, also controllable via foot pedal (advanced version)
- Programmable motor homing position
- Center injection holder for syringe or dispense nozzle
- Lid lock and vacuum sensor for user safety
- Large (detachable) touchscreen display
- USB-port to store recipes on USB-drive and for software updates specifications drive-unit
- Indirect brushless drive unit - up to 12.000 RPM
- High acceleration and accuracy: 1 - 30.000 RPM
- Clockwise/counter clockwise rotation and puddle mode
- Unique design to switch between desktop and in-deck model
