The POLOS® SPIN500x is the largest spin processor in the SPINx family, developed for applications requiring precise processing of large substrates. Supporting sizes up to 450 mm for round wafers and 350 × 350 mm for square substrates, it offers the capacity and flexibility needed for advanced R&D and automated production.
Designed exclusively in the Advanced configuration, the SPIN500x combines controlled spin processing with a modular platform that can be adapted to different production setups. Its standard Natural Polypropylene (NPP) construction provides a versatile solution for wet-process applications, with PTFE available as an option for chemically demanding processes.
From research laboratories to automated manufacturing lines, the SPIN500x supports scalable workflows with a focus on coating uniformity, repeatability, and ease of integration.
One platform, multiple installation options
The modular SPIN500x can be installed on a tabletop or incorporated into an in-deck system. Conversion is facilitated by the design of the outer housing and integrated drain architecture. Additional accessories allow users to configure the processor around their application, including dispensing requirements and operator ergonomics.
Precision handling and automation support
For automated substrate transfer, the SPIN500x offers programmable motor homing positions to support alignment with robotic handling systems. Its raised vacuum chuck sits above the process bowl rim, providing convenient access to the substrate. This arrangement supports handling with tweezers, vacuum wands, and robotic end-effectors in manual, semi-automated, or automated setups.
Streamlined lid operation
The Advanced model features automatic lid operation through the touchscreen, with an optional foot pedal for additional flexibility. This functionality is useful when working in gloveboxes or when operators need to keep their hands free. Recipes can also be configured to open the lid automatically at the end of a process, helping simplify handling and improve workflow efficiency.
Liquid protection and easy inspection
To help safeguard the vacuum system, the SPIN500x incorporates a liquid filter trap between the process chamber and vacuum lines. In the event of accidental liquid ingress, the trap collects fluid before it can reach critical components such as the drive unit, vacuum sensor, valve, or ServoBL Controller. The removable collection container is visible through a side window, allowing users to check its contents quickly as part of regular maintenance.
SPIN500x hardware specifications
Process chamber
- PTFE
- Supports wafers up to 450 mm (15”) or square substrates up to 350 × 350 mm
- Integrated liquid filter trap
- Automatic lid with optional foot-pedal operation
- Programmable motor homing
- Center-mounted syringe or dispense nozzle holder
- Lid lock and vacuum sensor
- Detachable touchscreen display
- USB connection for recipe storage and software updates
Drive unit
- Clockwise and counter-clockwise rotation
- Puddle mode
- Convertible tabletop or in-deck configuration
