The POLOS® PC330 is a compact, table-top ultrasonic spray coating system designed specifically for photoresist application on wafers up to 300 mm (12"). Utilizing advanced ultrasonic technology, it enables highly uniform coatings across a wide range of substrate types, including MEMS, masks, and other topographically complex surfaces.
Exceptional efficiency & precision
With material usage efficiency exceeding 95%, the PC330 minimizes photoresist consumption compared to traditional coating methods. This translates into significant cost savings while maintaining consistent, high-precision coating thicknesses from 1 to 100 microns, ideal for research labs and process development environments.
Engineered for flexibility
The system includes a vacuum heating plate with adjustable sizing to accommodate various wafer dimensions. Users can also select from a broad range of ultrasonic nozzles and complementary options, enabling full customization to meet specific process needs.
Compact & user-friendly
Designed with operator experience in mind, the POLOS® PC330 features intuitive software controls and a space-efficient footprint. It combines ease of use with advanced functionality, giving users the ability to fine-tune their process with confidence.
Advanced ultrasonic atomization
At the heart of the system is patented ultrasonic spray coating technology. It delivers a fine, controlled mist application for highly uniform coverage, even on non-flat or structured surfaces.
Key features
- Bench-top system
- Better coverage of microstructure and controllable coating area than spin coating
- High precision nanoparticle coating due to Ultrasonic Nozzle, material consumption ratio > 95%
- Compatible with all series of POLOS® by Siansonic® nozzles; spray width from 1 mm to 100 mm and flow rate of 0.001 ml/min - 50 ml/min
- Max. spray area: 300 mm x 300 mm (12")
- Uniformity: >95%
- Liquid viscosity: <30 cps
- Thickness of coating: 1 - 100 micron (depending on material)
- XYZ servo motion system
- Precision syringe pump
- Exhaust system
- Laser light for positioning of nozzle
- Switchable multi-channel vacuum heating plate for wafers of 4”, 6”, 8” and 12"
