Features

Features

  • •  Affordable Spin Coater
  • •  Spin processor for cleaning, drying, coating, developing and/or etching of up to Ø 260 mm substrates
  • •  Full-Plastic System in Natural Polypropylene (NPP)
  • •  Table-Top Model for manual or automated (optional) chemical dispense
  • •  Transparent Lid with syringe holder for central dispensing
  • •  Electro-magnetic safety lid lock
  • •  Detachable controller interface for easy integration
  • •  N2 diffuser for N2 purge during process.
  • •  Easy, step- by- step recipe programming via large colour touchscreen.
  • •  Unlimited Program Storage for recipes with multiple steps / each for:
    • •  Time 0.1-99999 sec/step
    • •  Speed 0-12,000 rpm **
    • •  Rotation direction (CW, CCW, puddling)
    • •  Acceleration /Deceleration 1-30,000 rpm/sec.**,selectable per step
    • •  Vacuum On /Off
  • •  3 Programmable Dry Contacts: e.g. for automated control of Dispense unit, Nitrogen diffuser, etc.
  • •  Structured and password protected recipe storage for easy and safe management
  • •  Digitally controlled Motor with digital incremental speed signal feed back
  • •  Includes: (1) standard Vacuum Chuck
    • •  A-V36-S45-PP, Ø45 mm for up to Ø 6“ wafers D-V10-S50-PP, Small Fragment Adapter for Ø ½“- Ø 2’’ Pieces and Fragments (Alternative Chucks optionally available)
  • •  Drain connection 1” male NPT
    • •  (Exhaust Hose optional)


** Measured without substrate, limitations may apply depending on chuck used and substrate specification.