Are you looking for any equipment to spin coat, develop, etch, spin rinse/dry?
Are you looking for any equipment to spin coat, develop, etch, spin rinse/dry?
Our spin coaters are suitable for spin coating, but also for developing, wet chemical etching or spin rinse/dry. The spin bowl construction material can be either Polypropylene (NPP) or PTFE (TFM) for maximum chemical compatibility. The basic units for fragments and substrate sizes up to 150 mm (SPIN150i) or up to 200 mm (SPIN200i) comes with full programming features and 3 I/O ports to add and control external equipment. The POLOS Advanced series can be customized to any spin coating or spin process requirement you may have.
