Do I need Compressed Air for pneumatic control?

Only for the POLOS advanced spin processors a compressed air connection is available. This is necessary to control valves, the use of a pneumatic lid or some of the other options, only available on the Advanced models. Connector: ID 6mm – OD 8mm. Requirement: min. 300 – max. 400kPa (or Min. 3.0bar – max. 4.0bar.)

About spincoating.com

POLOS spin coaters and spin processors are specially build in Germany for SPS-Europe. Our spinners meet the highest quality standards for the Semiconductor, Biotechnology, and Nanotechnology industries.

CONTACT US:
Phone: +31 341 360 590

Applications

Spin coater Drying
The POLOS spin coaters have proven to be an excellent cleaning, rinsing and drying solution after wafer processing.

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Rinse / Cleaning
Rinse / CleaningTraditional batch hydrogen peroxide-based wafer cleaning methods involve immersion in tanks for RCA and SC2 cleaning.

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Spin Etching
Puddle etching method of thin film by using spin coater. All unit are suitable for Puddle etching processes.

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Manual Coating
Manual Dispense Spin Coater are perfectly suitable for a wide range of applications, including drying rinsing cleaning, and coating.

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Automatic Coating
Automatic Dispense Spin coater are perfectly suitable for a wide range of applications, including drying, rinsing, cleaning, and coating.

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Spin Coater Developing
A full range of substrate size matching vacuum or non-vacuum chucks is available, for easy centering.

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