Spin Coater Developing spin coater

Spin Coater Developing

SPIN COATER REQUIREMENTS:
√ Spin coater POLOS Advanced with Automatic Chemical Dispense
√ Teflon® (PTFE) Housing
√ Exhaust / Drain Combination
√ Dispense Vessel

SPIN COATER OPTIONS:

A full range of substrate size matching vacuum or non-vacuum chucks is available, for easy centering.
√ Centering Tool
√ Backside Rinse
√ Edge Bead Removal
√ Additional Injector Lines
√ Auto Lid-Lock

SPIN COATER RECOMMENDED MODELS:
Up to 150mm:
√ SPIN COATER SPIN150i in PTFE or POLOS 150 Advanced PTFE

Up to 200mm:
√ SPIN COATER SPIN200i in PTFE or POLOS 200 Advanced PTFE

Up to 300mm:
√ SPIN COATER POLOS 300 Advanced PTFE

CHECK CHEMICAL COMPATIBILITY OF YOUR PROCESS WITH THE NPP OR PTFE BOWL-MATERIAL.

Example Megasonic Enhanced Photoresist Strip with DiO3

About spincoating.com

POLOS spin coaters and spin processors are specially build in Germany for SPS-Europe. Our spinners meet the highest quality standards for the Semiconductor, Biotechnology, and Nanotechnology industries.

CONTACT US:
Phone: +31 341 360 590

Applications

Spin coater Drying
The POLOS spin coaters have proven to be an excellent cleaning, rinsing and drying solution after wafer processing.

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Rinse / Cleaning
Rinse / CleaningTraditional batch hydrogen peroxide-based wafer cleaning methods involve immersion in tanks for RCA and SC2 cleaning.

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Spin Etching
Puddle etching method of thin film by using spin coater. All unit are suitable for Puddle etching processes.

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Manual Coating
Manual Dispense Spin Coater are perfectly suitable for a wide range of applications, including drying rinsing cleaning, and coating.

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Automatic Coating
Automatic Dispense Spin coater are perfectly suitable for a wide range of applications, including drying, rinsing, cleaning, and coating.

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Spin Coater Developing
A full range of substrate size matching vacuum or non-vacuum chucks is available, for easy centering.

Read more

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