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POLOS spin coaters and spin processors are specially build in Germany for SPS-Europe. Our spinners meet the highest quality standards for the Semiconductor, Biotechnology, and Nanotechnology industries. Go to SPS-Europe.

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  Spin coater Drying
  The POLOS spin coaters have proven to be an excellent cleaning, rinsing and drying solution after wafer processing.
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  Rinse / Cleaning
  Rinse / CleaningTraditional batch hydrogen peroxide-based wafer cleaning methods involve immersion in tanks for RCA and SC2 cleaning.
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  Spin Etching
  Puddle etching method of thin film by using spin coater. All unit are suitable for Puddle etching processes.
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  Manual Coating
  Manual Dispense Spin Coater are perfectly suitable for a wide range of applications, including drying rinsing cleaning, and coating.
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  Automatic Coating
  Automatic Dispense Spin coater are perfectly suitable for a wide range of applications, including drying, rinsing, cleaning, and coating.
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  Spin Coater Developing
  A full range of substrate size matching vacuum or non-vacuum chucks is available, for easy centering.
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