SPIN150i

Fragment Adapter

Product description

Fragment Adapter, material NPP.

With a vacuum area of 2.5 mm, fits easily on the standard A-V36-S45-PP vacuum chuck, that comes standard with the SPIN150i.

Outer diameter 50 mm.

SPIN150i

Fragment Adapter

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Specifications

Brand

SPIN150i

Product Number

D-V2.5-S50-PP

Files

D-V25-S50-PP-02.jpg

D-V25-S50-PP-03.jpg

D-V25-S50-PP-04.jpg

D-V25-S50-PP-05.jpg

About spincoating.com

POLOS spin coaters and spin processors are specially build in Germany for SPS-Europe. Our spinners meet the highest quality standards for the Semiconductor, Biotechnology, and Nanotechnology industries.

CONTACT US:
Phone: +31 341 360 590

Applications

Spin coater Drying
The POLOS spin coaters have proven to be an excellent cleaning, rinsing and drying solution after wafer processing.

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Rinse / Cleaning
Rinse / CleaningTraditional batch hydrogen peroxide-based wafer cleaning methods involve immersion in tanks for RCA and SC2 cleaning.

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Spin Etching
Puddle etching method of thin film by using spin coater. All unit are suitable for Puddle etching processes.

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Manual Coating
Manual Dispense Spin Coater are perfectly suitable for a wide range of applications, including drying rinsing cleaning, and coating.

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Automatic Coating
Automatic Dispense Spin coater are perfectly suitable for a wide range of applications, including drying, rinsing, cleaning, and coating.

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Spin Coater Developing
A full range of substrate size matching vacuum or non-vacuum chucks is available, for easy centering.

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