SPIN150i

Centering Tool

Product description

Centering Aid for easy centration of your substrate for use with the spin processor SPIN150i.

Centering aid for SPIN150i
One tool for substrate sizes from 2" up to 6" and square substrates upto 4"x4"

SPIN150i

Centering Tool

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Specifications

Brand

SPIN150i

Product Number

F-S-SPIN150

About spincoating.com

POLOS spin coaters and spin processors are specially build in Germany for SPS-Europe. Our spinners meet the highest quality standards for the Semiconductor, Biotechnology, and Nanotechnology industries.

CONTACT US:
Phone: +31 341 360 590

Applications

Spin coater Drying
The POLOS spin coaters have proven to be an excellent cleaning, rinsing and drying solution after wafer processing.

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Rinse / Cleaning
Rinse / CleaningTraditional batch hydrogen peroxide-based wafer cleaning methods involve immersion in tanks for RCA and SC2 cleaning.

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Spin Etching
Puddle etching method of thin film by using spin coater. All unit are suitable for Puddle etching processes.

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Manual Coating
Manual Dispense Spin Coater are perfectly suitable for a wide range of applications, including drying rinsing cleaning, and coating.

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Automatic Coating
Automatic Dispense Spin coater are perfectly suitable for a wide range of applications, including drying, rinsing, cleaning, and coating.

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Spin Coater Developing
A full range of substrate size matching vacuum or non-vacuum chucks is available, for easy centering.

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