Spin coaters SPIN200i NPP Table Top / SPIN200i PTFE Table Top
This table-top spin processor is seamless build in a full-plastic, housing in natural polypropylene (NPP) or optional PTFE. Includes a FREE vacuum chuck and fragment adapter
Models
SPIN200i-NPP Integrator / SPIN200i-PTFE Integrator
Suitable for easy integration in your existing or new wetbench. Available in natural polypropylene (NPP) or optional PTFE process chamber. Includes a FREE vacuum chuck and fragment adapter
Suitable for easy integration in your existing or new wetbench. Available in natural polypropylene (NPP) or optional PTFE process chamber. Includes a FREE vacuum chuck and fragment adapter
Applications
The POLOS spin coaters have proven to be an excellent cleaning, rinsing and drying solution after wafer processing.
Rinse / CleaningTraditional batch hydrogen peroxide-based wafer cleaning methods involve immersion in tanks for RCA and SC2 cleaning.
Puddle etching method of thin film by using spin coater. All unit are suitable for Puddle etching processes.
Manual Dispense Spin Coater are perfectly suitable for a wide range of applications, including drying rinsing cleaning, and coating.
Automatic Dispense Spin coater are perfectly suitable for a wide range of applications, including drying, rinsing, cleaning, and coating.
A full range of substrate size matching vacuum or non-vacuum chucks is available, for easy centering.