Substrate size ≤ 150mm
Substrate size ≤ 200 mm
Substrate size ≤ 300mm
Substrate size ≥ 450mm
Spin Process Stations

The POLOS Advanced 300 spin coater is suitable for processing fragments of  Ø300mm/12 inch wafers (or Ø360mm substrates), or 8"x8" square substrates. The unit is also available as an in-deck version for integration into your wetbench. The POLOS Advanced series spin processors are very versatile spincoaters for a wide range of processes, including developing or etching.  The units are completely custom-build to meet customer requirements. Domed lid and multiple chemical dispense lines are optionally available. 

Includes a FREE vacuum chuck

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