Substrate size ≤ 150mm
Substrate size ≤ 200 mm
Substrate size ≤ 300mm
Substrate size ≥ 450mm
Spin Process Stations

Both spin coaters the POLOS SPIN200i and POLOS Advanced 200 are suitable for processing fragments of  Ø 200 mm / 8 inch wafers (or Ø 260 mm substrates), or 6"x6" square substrates.

Both models are available in Table top of In Deck models for integration into your wetbench.

The POLOS SPIN series standard comes with 3 I/O ports, to hook up with for example a foot-pedal for hands-free operation or dispense units. 

The POLOS Advanced can be completely customized to customer demands, including domed lid and multiple chemical dispense lines. The Polos Advanced series allow the user to either dispense manually through the syringe or by using the optional manifold, with selectable valve(s) for dispensing chemical from the Dispense Vessel (DV), DI Water or N2.

Includes a FREE vacuum chuck

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