Spin Process Station

 
THE PROCESS STATION COATING & DEVELOPING

The POLOS Spin Process Station is an extremely versatile platform for a wide range of processes. Based on the proven high quality POLOS Single Substrate Spin Processor, the modular design provides excellent value for money: full plastic construction, with high-end components, compatible with any chemical environment in a modular set-up, suitable for your specific requirement.

Successfully installed at customers worldwide, e.g. FhG ENAS in Germany or University Queensland in Australia.

Applications: cleaning substrates / photomasks, photoresist coating, developing, etching and lift-off processes.

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Fully integrated cabinet with double spin chambers for safe and clean coating & developing process

Compact integrated solution in single cabinet:

  • Full-Plastic enclosure with 20mm thick wall in Natural Polypropylene (NPP)
  • Closed chamber with Transparent Lid for easy process control
  • DI-water and Nitrogen spray guns Located in handy position to facilitate cleaning of the chamber
  • Safe liquid sensor(s) for leakage and choked drain detection
  • Exhaust presence monitoring system

Coater equipped with:

  • Fully automated dosing pump
  • Dynamic movable dispense arm with constant or Rpm related speed control for maximum uniformity among whole substrate surface
  • Front and back side adjustable Edge Bead Removal
  • Nitrogen dry optionally available through lid or movable arm
  • Digitally controlled brushless motor with highly accurate speed control and acceleration selectable per recipe step

Developer equipped with:

  • Fully automated top spray developing system with double contained lines
  • HD drive suitable for chemical saver “puddle” developing
  • Developer dispensed through dispense vessel
  • Substrate Front & Back Side In Situ Di Water Rinse with manually adjustable flow rate
  • Combined chamber rinse and purge system for safe access to process chamber
  • Selectable drain line with integrated drain canister for waste collecting
Specifications  
Available number of programs 999
Steps per program 100
Spin speed* 1 - 10,000 rpm** ± 1rpm steps
Spin speed accuracy ± 0.1 rpm **
Spin rotational direction Clockwise, Counter clockwise
Max. acceleration 30,000 rpm/sec
Acceleration accuray ± 0.1 rpm/sec
Spin speed read out accuray ± 0.1 rpm
System data  
Interface Keyboard and LCD full size display, chemical resistant, IP50
Tank model 2x NPP process tank, 10 L effective volume
Utilities DIW spray gun, N2 spray gun, vacuum wand, front light indicators
Chamber diameter 302 mm
Dimension (desktop version) 1400 (w) x 1600 (h) x 950 (d) mm
Safety Leak sensor, drain sensor, ShutDown supply valve

Details

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