SPIN COATERS SPIN150i-NPP Table Top / SPIN150i-PTFE Table Top
Table Top Model for manual or optionally automated chemical dispense. High quality seamless NPP fabrication. Optional in PTFE. Includes a vacuum chuck and FREE fragment adapter
Models
SPIN COATERS SPIN150i NPP Integrator / SPIN150i PTFE Integrator
Easy in-deck integration in your existing or new wetbench. Available in natural polypropylene (NPP) or optional PTFE process chamber. Includes a vacuum chuck and FREE fragment adapter
Easy in-deck integration in your existing or new wetbench. Available in natural polypropylene (NPP) or optional PTFE process chamber. Includes a vacuum chuck and FREE fragment adapter
Applications
The POLOS spin coaters have proven to be an excellent cleaning, rinsing and drying solution after wafer processing.
Rinse / CleaningTraditional batch hydrogen peroxide-based wafer cleaning methods involve immersion in tanks for RCA and SC2 cleaning.
Puddle etching method of thin film by using spin coater. All unit are suitable for Puddle etching processes.
Manual Dispense Spin Coater are perfectly suitable for a wide range of applications, including drying rinsing cleaning, and coating.
Automatic Dispense Spin coater are perfectly suitable for a wide range of applications, including drying, rinsing, cleaning, and coating.
A full range of substrate size matching vacuum or non-vacuum chucks is available, for easy centering.