POLOS200 Advanced-NPP Table-Top / POLOS200 Advanced-PTFE Table-Top
This table-top spin processor is seamless build in a full-plastic, housing in natural polypropylene (NPP) or optional PTFE. Includes a FREE vacuum chuck
POLOS200 Advanced
THE POLOS200 SPIN COATER
The POLOS 200 spin coaters can be manual or optional semi-automatic chemical dispense with clear/transparent flat top lid, with center hole. Seamless full-plastic housing in Natural Polypropylene. For fragments and substrates up to Ø200 (or 8”) or 6" x 6".
Coating, Etching, Cleaning, Drying, Developing
Compatible with advanced option such as:
- backside rinsing
- automatic lid opening
- up to 16 digital I/O and 4 analog I/O
Includes a FREE vacuum chuck
Call us
+31 341 360 590
+31 341 360 590
POLOS200 Advanced-NPP Integrator / POLOS200 Advanced-PTFE Integrator
Suitable for easy integration in your existing or new wetbench. Available in natural polypropylene (NPP) or optional PTFE process chamber. Includes a FREE vacuum chuck
Suitable for easy integration in your existing or new wetbench. Available in natural polypropylene (NPP) or optional PTFE process chamber. Includes a FREE vacuum chuck
Applications
The POLOS spin coaters have proven to be an excellent cleaning, rinsing and drying solution after wafer processing.
Rinse / CleaningTraditional batch hydrogen peroxide-based wafer cleaning methods involve immersion in tanks for RCA and SC2 cleaning.
Puddle etching method of thin film by using spin coater. All unit are suitable for Puddle etching processes.
Manual Dispense Spin Coater are perfectly suitable for a wide range of applications, including drying rinsing cleaning, and coating.
Automatic Dispense Spin coater are perfectly suitable for a wide range of applications, including drying, rinsing, cleaning, and coating.
A full range of substrate size matching vacuum or non-vacuum chucks is available, for easy centering.