Our high - quality, all NPP POLOS single wafer spin coaters are specifically designed for R&D and low volume production in the MEMS, Semiconductor, PV, Microfluidics field, etc. Suitable for all typical spin processes: cleaning, rinse/dry, coating, developing and etching.
The low-cost SPIN150i spin coater is suitable for processing fragments as small as 5 mm up to Ø150 (or 6”) or 4" x 4" substrates. Detachable touchpanel. Unlimited Program Storage for recipes with multiple steps each (CW & CCW rotation for puddle spin coating applications.)
Highlights
Specifications | |
Available number of programs | Unlimited * |
Steps per program | Unlimited * |
Spin speed* | 1 - 12,000 rpm ** ± 1rpm steps |
Spin speed accuracy | ± 0.1 rpm ** |
Spin rotational direction | Clockwise, Counter clockwise, Puddle |
Max. acceleration | 30,000 rpm/sec ** |
Spin time | Unlimited*, ± 0.1 seconds steps |
Free programmable outputs | 3 dry relays, nominal switching capacity 0.5A /125 VAC - 0.3A / 60DC |
System data | |
Housing material | Natural Polypropylene (NPP) *** |
Process chamber material | Natural Polypropylene (NPP) *** |
Interface | Detachable, full-size touchscreen, glove-friendly,IP52, chemical resistant |
External connection | 1 USB Port in the controller |
Max. substrate diameter | 160mm round or 4ʺ x 4ʺ square |
Max. process chamber diameter | 202 mm |
Dimension (desktop version) | 274 (w) x 250 (h) x 451 (d) mm |
Shipping weight | 14 kgs |
Shipping dimension | 600 x 380 x 360 mm |
Requirements | |
Voltage | 100 - 120 VAC / 200 - 240 VAC 50/60 Hz (auto select) |
Power consumption | Max. 500 W |
Max. current | 5A / 2.5A |
Vacuum | - 65 kPa (-19 inchHg), ≥ 80 lpm Tube OD Ø8mm |
Motor purge gas | 20 - 50 kPa, 2-5 l/min, Tube OD Ø 6mm |
Drain connection | 1” M-NPT |
* Considering additional capability of standard unit such as USB backup, recipe cycling, PC software etc.
** Measured without substrate, limitations may apply depending on chuck used and substrate specification.
*** For our spin processors and chucks we use NPP-H with α-crystalline properties.
Features
** Measured without substrate, limitations may apply depending on chuck used and substrate specification.
Customized vacuum or mechanical chucks are available for almost any application.
Chucks are available in following materials:
Note: other materials available on request, please contact us for details.
Please select your material.
Please choose if syringe holder for center dispensing or static barrier plate is required.
Please specify the dispense system if required.
Choose your first topside injector type.
Choose your second topside injector type.
Please indicate if an automated chemical delivery system is required.
Please indicate if a second automated chemical delivery system is required
Please indicate preferred drain option.
Please specify the required drain tube length.
Please indicate if a drain canister is required for waste storage.
POLOS spin coaters and spin processors are specially build in Germany for SPS-Europe. Our spinners meet the highest quality standards for the Semiconductor, Biotechnology, and Nanotechnology industries.
CONTACT US:
Phone: +31 341 360 590
.
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