POLOS Hotplate
Our table top hotplate enables upgradeable options like lifting pins, vacuum bake, proximity pins and hinged lid, this making it a versatile and affordable tool for R&D and pilot lines. A precision digital temperature controller enables adjustable temperature steps of 1 °C up to 230 °C. It is suitable for soft bake as well as hard bake processes, and curing of photoresist, epoxy or any other work requiring precise temperature control. Operational Environments, the system is designed for an ambient temperature of 10°C - 40°C.
Features- Diagnostic serial interface (RS232)
- Precision temperature controlling system. Uniform temp.: +/- 0,5 °C
- Digital temperature controller: adjustable in steps of 1 °C
- Countdown timer (1-999 sec.) with acoustic alert
Models:
POLOS Hotplate 200S
Dimensions with Hinged Lid: 450x320x200mm
Substrate size: 200mm
Weight: 12kg
POLOS Hotplate 500S
Dimensions with Hinged Lid: 700x700x370mm
Substrate size: 500mm
Weight: 60kg
Options:
- Hinged lid
- Proximity pins
- Lifting pins
- Vacuum bake.
+31 341 360 590
| Specifications | |
| Temperature ranges | From 50 - 230 °C (adjustable in steps of 1 °C) |
| Programmable storage |
10 programs (temperature/time) |
| Temperature uniformity | ± 0,5 °C |
| Heater surface |
area 220 x 220 mm |
| Suitable | for 1 x 8” wafer |
| Heater block material | Aluminum (anodized) |
| Dimensions with Hinged Lid | 450 x 320 x 200 mm |
| Dimensions device | 450 x 320 x 135 mm |
| Weight |
12 KG |
| Options | Hinged lid, proximity pins, lifting pins or vacuum bake |
| Operating requirements | |
| Voltage | 110 or 240 VAC/ 50/60 Hz |
| Max. current | 2,5 / 5A |
| Power consumption (max.) | 550 Watt |
The POLOS spin coaters have proven to be an excellent cleaning, rinsing and drying solution after wafer processing.
Rinse / CleaningTraditional batch hydrogen peroxide-based wafer cleaning methods involve immersion in tanks for RCA and SC2 cleaning.
Puddle etching method of thin film by using spin coater. All unit are suitable for Puddle etching processes.
Manual Dispense Spin Coater are perfectly suitable for a wide range of applications, including drying rinsing cleaning, and coating.
Automatic Dispense Spin coater are perfectly suitable for a wide range of applications, including drying, rinsing, cleaning, and coating.
A full range of substrate size matching vacuum or non-vacuum chucks is available, for easy centering.