POLOS Hotplate

THE POLOS Hotplate

Our table top hotplate enables upgradeable options like lifting pins, vacuum bake, proximity pins and hinged lid, this making it a versatile and affordable tool for R&D and pilot lines. A precision digital temperature controller enables adjustable temperature steps of 1 °C up to 230 °C. It is suitable for soft bake as well as hard bake processes, and curing of photoresist, epoxy or any other work requiring precise temperature control. Operational Environments, the system is designed for an ambient temperature of 10°C - 40°C.

  • Diagnostic serial interface (RS232)
  • Precision temperature controlling system. Uniform temp.: +/- 0,5 °C
  • Digital temperature controller: adjustable in steps of 1 °C
  • Countdown timer (1-999 sec.) with acoustic alert

POLOS Hotplate 200S
Dimensions with Hinged Lid: 450x320x200mm
Substrate size: 200mm
Weight: 12kg

POLOS Hotplate 500S
Dimensions with Hinged Lid: 700x700x370mm
Substrate size: 500mm
Weight: 60kg


  • Hinged lid
  • Proximity pins
  • Lifting pins
  • Vacuum bake.


Temperature ranges From 50 - 230 °C (adjustable in steps of 1 °C)
Programmable storage

10 programs (temperature/time)

Temperature uniformity ± 0,5 °C
Heater surface

area 220 x 220 mm

Suitable for 1 x 8” wafer
Heater block material Aluminum (anodized)
Dimensions with Hinged Lid 450 x 320 x 200 mm
Dimensions device 450 x 320 x 135 mm

12 KG

Options Hinged lid, proximity pins, lifting pins or vacuum bake
Operating requirements  
Voltage 110 or 240 VAC/ 50/60 Hz
Max. current 2,5 / 5A
Power consumption (max.) 550 Watt



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