Multiple designs from different files can be written in one process. Tilted/warped substrate compensation via 3-point focus or 4-point bilinear measurement. Mesh type calibration for full-bed curvature.
Recommended raster step of included objectives:
Fine (40x NA0.65): 0.8 µm
Medium (10x NA0.25): 2 µm
Coarse (4x NA0.1): 5 µm
Effective writing speed of included objectives on big areas (unidirectional writing):
Fine: 1.7 mm2/min
Medium: 4.25 mm2/min
Coarse: 10.6 mm2/min
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