POLOS Micro Writer
- High end/low cost lithography
- Very robust and simple
- Reduced requirements and easier maintenance
Technical specifications
- Typical writing speed: 100 - 120 mm/s
- Maximum area: 100 x 92 mm^2
- Mech. Short range noise onslow and on fast axis: < 1µm
- Realistic minimum feature size 6 - 15 µm depending on the feature
Multiple designs from different files can be written in one process. Tilted/warped substrate compensation via 3-point focus or 4-point bilinear measurement. Mesh type calibration for full-bed curvature.
Optics
Recommended raster step of included objectives:
Fine (40x NA0.65): 0.8 µm
Medium (10x NA0.25): 2 µm
Coarse (4x NA0.1): 5 µm
Effective writing speed of included objectives on big areas (unidirectional writing):
Fine: 1.7 mm2/min
Medium: 4.25 mm2/min
Coarse: 10.6 mm2/min
Please fill in our contact form to get a quote/ more information.
+31 341 360 590