Light source: Exposure: 435 nm; alignment: 525 nm
Minimum feature size: Adjustable from 2 to 23 µm
Alignment resolution: Down to 1 µm/cm2
Maximum exposure area: 75 x 75 mm2
Substrate size: Up to 4” wafers
System dimensions: W: (36 cm); D: (36 cm); H: (60 cm)
POLOS spin coaters and spin processors are specially build in Germany for SPS-Europe. Our spinners meet the highest quality standards for the Semiconductor, Biotechnology, and Nanotechnology industries. Go to SPS-Europe.
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