POLOS Micro Printer
THE POLOS µPrinter
The POLOS µPrinter is a maskless lithography equipment for rapid-prororyping, based on a µLCD projection technology, compatible with a wide range of resists and substrates. Our system can produce any 2D shapes at micron resolution without the need for a hard-mask.
Key features
- Writing resolution down to 2 µm
- Adjustable writing field and resolution with exchangeable objectives
- Compatible with CAD files or bitmap images
- Compatible with g-line photo resists
- Compatible with a wide range of substrates (silicon, glass, metal, plastic, ...)
- Compatible with any sample size up to 4” wafer
- Camera feedback for alignment steps
Key benefits
- Time and money saving due to the absence of a hard-mask
- lntuitive alignment method with direct overlay of the design on the sample
- Table-top with very small foot print
- Technology well suited for microelectronics, 2D-materials, microfluidics, optoelectronics, opties or any other 2D microfabrication application
Micro-fabrication system
Light source: Exposure: 435 nm; alignment: 525 nm
Minimum feature size: Adjustable from 2 to 23 µm
Alignment resolution: Down to 1 µm/cm2
Maximum exposure area: 75 x 75 mm2
Substrate size: Up to 4” wafers
System dimensions: W: (36 cm); D: (36 cm); H: (60 cm)
Call us
+31 341 360 590
+31 341 360 590
Applications
The POLOS spin coaters have proven to be an excellent cleaning, rinsing and drying solution after wafer processing.
Rinse / CleaningTraditional batch hydrogen peroxide-based wafer cleaning methods involve immersion in tanks for RCA and SC2 cleaning.
Puddle etching method of thin film by using spin coater. All unit are suitable for Puddle etching processes.
Manual Dispense Spin Coater are perfectly suitable for a wide range of applications, including drying rinsing cleaning, and coating.
Automatic Dispense Spin coater are perfectly suitable for a wide range of applications, including drying, rinsing, cleaning, and coating.
A full range of substrate size matching vacuum or non-vacuum chucks is available, for easy centering.