√ Spin Process Station
√ Up to 150mm: POLOS SPIN150i-NPP* / POLOS 200 Advanced NPP*
√ Up to 200mm: POLOS SPIN200i-NPP / POLOS 200 Advanced NPP*
√ Up to 300mm: POLOS 300 Advanced*
Puddle etching method of thin film by using spin coater
*All unit are suitable for Puddle Etching processes, speedrates can be set from 1 up to 7.000 rpm, chuck turning can be programmed to rotate alternating between clockwise and counter clockwise.
CHECK CHEMICAL COMPATIBILITY OF YOUR PROCESS WITH THE NPP OR PTFE BOWL-MATERIAL.
POLOS spin coaters and spin processors are specially build in Germany for SPS-Europe. Our spinners meet the highest quality standards for the Semiconductor, Biotechnology, and Nanotechnology industries. Go to SPS-Europe.
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