The POLOS spin coaters have proven to be an excellent cleaning, rinsing and drying solution after wafer processing.
Please find below our cost-effective POLOS SPIN150i and SPIN200i spin processors for spin drying. With a low contact mechanical chuck no vacuum line or vacuum pump is required.
Use Low Contact Chuck (non-vacuum chuck) only the edge of the substrate is in contact with the chuck
Single Wafer Chemical or Residual Removal
Spin, Rinse, and Dry semiconductor wafers after a wet process
Up to 150mm: SPIN COATER SPIN150i-NPP
Note: For batch applications: sps-europe.com offer refurbishment services of your SRD Spin Rinse Dryers. Contact us!