Manual Coating
Manual Coating
Manual Dispense Spin Coater
The single substrate spin coaters are perfectly suitable for a wide range of applications, including drying rinsing cleaning, and coating. All of our spin coaters are also available in indeck version. Standard unit come with 3 I/O ports, and allows for connection to a dispenser for automatic fluid dispense of up to 3 lines. (The POLOS Advanced models offers unlimited possibilities.) Click here to learn more about our integrator indeck versions.
Up to 150mm
√ SPIN150i-NPP
√ SPIN150i-integrator In-Deck Model
√ HIGH RES 360
Up to 200mm
√ SPIN200i-NPP
√ SPIN200i-integrator In-Deck Model
√ HIGH RES 360
Up to 300mm
√ POLOS 300 Advanced in NPP or PTFE.
Applications
The POLOS spin coaters have proven to be an excellent cleaning, rinsing and drying solution after wafer processing.
Rinse / CleaningTraditional batch hydrogen peroxide-based wafer cleaning methods involve immersion in tanks for RCA and SC2 cleaning.
Puddle etching method of thin film by using spin coater. All unit are suitable for Puddle etching processes.
Manual Dispense Spin Coater are perfectly suitable for a wide range of applications, including drying rinsing cleaning, and coating.
Automatic Dispense Spin coater are perfectly suitable for a wide range of applications, including drying, rinsing, cleaning, and coating.
A full range of substrate size matching vacuum or non-vacuum chucks is available, for easy centering.