Single substrate spin processing is widely used in the semiconductor industry, where spin coating can be used to create thin films of less than 10nm thickness. Spin processing can be used for cleaning or etching. Most substrates can be spin processed, including wafers, microscopeslides, photomasks, or even small pieces etc.
Our POLOS spin coaters are used for both cleaning applications as well as photolithography, to deposit layers of photoresist typically 1 micrometer thick. POLOS spin coaters are available for all sizes, ranging from small pieces to large 450 mm diameter substrates.