Uniform spin coating up to 12,000 rpm
Uniform spin coating up to 12,000 rpm
Spin etch – develop – clean - coat
Spin etch – develop – clean - coat
Megasonic cleaning on spin coater
Megasonic cleaning on spin coater
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2 year warranty
Custom System Configuration

The SPIN COATER applications

Single substrate spin processing is widely used in the semiconductor industry, where spin coating can be used to create thin films of less than 10nm thickness.  Spin processing can be used for cleaning or etching.  Most substrates can be spin processed, including wafers, microscopeslides, photomasks, or even small pieces etc. 

Our POLOS spin coaters are used for both cleaning applications as well as photolithography, to deposit layers of photoresist typically 1 micrometer thick. POLOS spin coaters are available for all sizes, ranging from small pieces to large 450 mm diameter substrates.

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