FEATURES ACD200-NPP Single Substrate Spin Processor:
- Automatic Chemical Dispense:
- dispensing fluids through up to 6 spray nozzles
- each programmable for sequential or parallel dispense
- Clear/Transparant Domed Lid with central integrated N2 shower purge
- Seamless Full-Plastic Housing in Natural Polypropylene (NPP)
- Table-Top Model: dimensions: 33 (w) x 55 (d) x 32 (h) cm
- Substrate size: fragments and substrates up to Ø260mm (or 8") or 6"x6"
- Servo-controlled Motor, assuring repeatable rpm rates
- Easy, step-by-step Programming via Gloved-Finger-Friendly, Full-Size Keyboard with LED Backlit Display
- Programmable Digital Process Controller:
- Storage of multiple programs of 99 Step Recipes each, for:
- Speed 1-10.000rpm, Time, Acceleration
- Vacuum On/Off
- Relay Open/Close
- Multi-User Access Levels
- 2 Programmable ON/OFF Switching Outputs
e.g. for Dispense On/Off, Nitrogen On/Off, etc.
- Drain connection
- CE-approved
Unit comes standard including 2 integrated spray nozzles and central N2 shower purge.
Vacuum Chuck A-V36-S45-PP and Small Fragment Adapter D-V10-S50-PP up to Ø150mm, or alternatively, Vacuum Chuck A-V87-S96-PP for larger substrates up to Ø200mm and (1) centering aid (F-Sx/POLOS200) are also included.

or 
Adapter D-V10-S50-PP, A-V87-S96-PP
easily fits on top of A-V36-S45-PP
A wide variety of other chucks, including non-vacuum, are available at request.
The POLOS ACD200 Spin Processors are available in NPP or PTFE, as Table-Top or OEM In-Deck unit.
OPTIONS
- OEM In-Deck Version (ID)
- PTFE Housing instead of Natural Polypro
- Heavy Duty Motor for Puddle Function (HD)
- Wafer Centering Tool (F-Sx/POLOS200)
- Drain Exhaust Hose (DEXT)
- Drain Exhauxt Seperation Port Tee (DET)
- Vacuum Pump (VP80)
- Dispense Vessel in PTFE (DV)
- Adjustable Injector Head (ILACD)
- Back-Side Rinse (BSR)
- Edge Bead Removal (EBR)
- Mini Wet Station (MWS)
TYPICAL APPLICATIONS:
PICTURE:

DOWNLOADS:
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